Question

In the purification process, the organic layer is washed sequentially with 2 M NaOH, water, and saturated aqueous sodium chloride. What is the purpose of each of this wash and why is cold 2 M NaOH recommended

Answer 1

Its washed with 2M Naoh to remove acidic impurities like sulphuric acid and HBr

Its washed in water to remove water soluble impurities

Its washed with Nacl to remove large quantity of water that may be in the organic layer

Step-by-step explanation: