Final answer:
Semiconductor fabrication facilities and research and development areas that use hazardous production materials are classified as Group Characteristic hazardous wastes. These materials are dangerous because they are toxic, corrosive, flammable, or reactive. Examples include arsenic, lead, and solvents.
Step-by-step explanation:
Semiconductor fabrication facilities and comparable research and development areas in which hazardous production materials (HPM) are used are classified as Group Characteristic hazardous wastes.
Characteristic hazardous wastes are materials that are dangerous because they are toxic, corrosive, flammable, or reactive. These facilities and areas are classified as such because they involve the use and handling of hazardous production materials, which can pose a substantial present or potential hazard to human health or the environment when improperly managed.
Examples of hazardous production materials commonly used in semiconductor fabrication facilities include arsenic, lead, and various solvents. These materials require special handling and disposal procedures to minimize their impact on human health and the environment.